LOW EMISSION IMPLANTATION MASK AND SUBSTRATE ASSEMBLY
A substrate assembly may include a substrate base; and a low emission implantation mask, disposed on the substrate base. The low emission implantation mask may include a carbon-containing material, the carbon-containing material comprising an isotopically purified carbon, formed from a 12C carbon is...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English French |
Published |
04.02.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A substrate assembly may include a substrate base; and a low emission implantation mask, disposed on the substrate base. The low emission implantation mask may include a carbon-containing material, the carbon-containing material comprising an isotopically purified carbon, formed from a 12C carbon isotope precursor.
Un ensemble substrat peut comprendre une base de substrat ; et un masque d'implantation à faible émission, disposé sur la base de substrat. Le masque d'implantation à faible émission peut comprendre un matériau contenant du carbone, le matériau contenant du carbone comprenant un carbone isotopiquement purifié, formé à partir d'un précurseur d'isotopes de carbone 12C. |
---|---|
AbstractList | A substrate assembly may include a substrate base; and a low emission implantation mask, disposed on the substrate base. The low emission implantation mask may include a carbon-containing material, the carbon-containing material comprising an isotopically purified carbon, formed from a 12C carbon isotope precursor.
Un ensemble substrat peut comprendre une base de substrat ; et un masque d'implantation à faible émission, disposé sur la base de substrat. Le masque d'implantation à faible émission peut comprendre un matériau contenant du carbone, le matériau contenant du carbone comprenant un carbone isotopiquement purifié, formé à partir d'un précurseur d'isotopes de carbone 12C. |
Author | BLAKE, Julian G SINCLAIR, Frank |
Author_xml | – fullname: SINCLAIR, Frank – fullname: BLAKE, Julian G |
BookMark | eNrjYmDJy89L5WQw9fEPV3D19QwO9vT3U_D0DfBx9AtxDAFxfB2DvRUc_VwUgkOdgkOCHENcFRyDg119nXwieRhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfLi_kYGRIRAZm5g4GhoTpwoArPwqdQ |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
DocumentTitleAlternate | MASQUE D'IMPLANTATION À FAIBLE ÉMISSION ET ENSEMBLE SUBSTRAT |
ExternalDocumentID | WO2021021344A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_WO2021021344A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:00:53 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English French |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_WO2021021344A13 |
Notes | Application Number: WO2020US39168 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210204&DB=EPODOC&CC=WO&NR=2021021344A1 |
ParticipantIDs | epo_espacenet_WO2021021344A1 |
PublicationCentury | 2000 |
PublicationDate | 20210204 |
PublicationDateYYYYMMDD | 2021-02-04 |
PublicationDate_xml | – month: 02 year: 2021 text: 20210204 day: 04 |
PublicationDecade | 2020 |
PublicationYear | 2021 |
RelatedCompanies | APPLIED MATERIALS, INC |
RelatedCompanies_xml | – name: APPLIED MATERIALS, INC |
Score | 3.3112898 |
Snippet | A substrate assembly may include a substrate base; and a low emission implantation mask, disposed on the substrate base. The low emission implantation mask may... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | LOW EMISSION IMPLANTATION MASK AND SUBSTRATE ASSEMBLY |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210204&DB=EPODOC&locale=&CC=WO&NR=2021021344A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KFfWmVbFaZUHJLWibzWMPRfKkal6Y1NZT6aYJCJIWG_HvO1lS7am33RnYJzOz3-zMLsCdxgeZwZkhZw96JlNtwGTOlLmcM15knBbKgteJwkGojcb0eapOW_C5yYUR74T-iMcRUaIylPdK6OvVvxPLEbGV63v-gaTlo5cOHalBxzV-wU13rKEbR05kS7aNuE0KXxteX6HURKy0hwdpvZYH982q81JW20bFO4b9GNsrqxNo5WUHDu3N32sdOAiaK28sNtK3PgXVjyYE100oQPIUxL4ZpsLHRAIzeSFm6JBkbNXfIKcuMZPEDSz__QxuPTe1RzL2P_ub7mwSbQ9WOYd2uSzzCyCqojNVRSpiFIpWhRUG43021_sLJGdaF3q7Wrrczb6Co7oqIpJpD9rV13d-jQa34jdinX4B3Ct94A |
link.rule.ids | 230,309,783,888,25576,76876 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8QNOKbokYUtYlmb4vCuo0-ELMvMmQfxA3Bp4WOkZiYQWTGf99bM5Qn3pq7pB_X3F1_114P4EHj3bTHWU9On_RUplqXyZwpczljfJlyulQWvEwU9gPNndCXmTqrwec2F0b8E_ojPkdEjUpR3wthr9f_QSxbvK3cPPIPJK2eB3Hflip0XOIX3HTb7Dvj0A4tybIQt0nBa8XrKJQaiJUO8JCtl_rgvJllXsp616kMTuBwjP3lxSnUsrwJDWtbe60JR3515Y3NSvs2Z6B64ZSg3IQBJEN_7BlBLGJMxDeiETECm0QTsyyDHDvEiCLHN733c7gfOLHlyjh-8rfcZBruTla5gHq-yrNLIKqiM1VFKmIUil6FLXuMd9hc7yyQnGotaO_r6Wo_-w4abux7iTcMRtdwXLLE62Tahnrx9Z3doPMt-K2Q2S_vN4DT |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=LOW+EMISSION+IMPLANTATION+MASK+AND+SUBSTRATE+ASSEMBLY&rft.inventor=SINCLAIR%2C+Frank&rft.inventor=BLAKE%2C+Julian+G&rft.date=2021-02-04&rft.externalDBID=A1&rft.externalDocID=WO2021021344A1 |