METHOD AND APPARATUS FOR TREATING DISCHARGE GAS CONTAINING TARGET GAS IN PLASMA STATE
The present invention relates to a method and apparatus for treating a discharge gas containing a target gas in a plasma state. In treating a discharge gas containing a target gas that is difficult to convert, the conventional method causes difficulties in terms of either requiring a high conversion...
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Main Authors | , , |
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Format | Patent |
Language | English French Korean |
Published |
16.01.2020
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Subjects | |
Online Access | Get full text |
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