METHOD AND APPARATUS FOR TREATING DISCHARGE GAS CONTAINING TARGET GAS IN PLASMA STATE

The present invention relates to a method and apparatus for treating a discharge gas containing a target gas in a plasma state. In treating a discharge gas containing a target gas that is difficult to convert, the conventional method causes difficulties in terms of either requiring a high conversion...

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Bibliographic Details
Main Authors PAEK, Kwang Hyun, JU, Wontae, JANG, Yun Sang
Format Patent
LanguageEnglish
French
Korean
Published 16.01.2020
Subjects
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