DIRECT GRAPHENE TRANSFER AND GRAPHENE-BASED DEVICES

A method of forming a functionalized device substrate is provided that includes the steps of: forming a graphene layer on a growth substrate; applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the said substrate; couplin...

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Bibliographic Details
Main Authors MARTIN-FRANCES, Miriam Marchena, WAGNER, Frederic Christian, ARLIGUIE, Therese Francoise, PRUNERI, Valerio, MAZUMDER, Prantik, CHANG, Theresa
Format Patent
LanguageEnglish
French
Published 23.05.2019
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Summary:A method of forming a functionalized device substrate is provided that includes the steps of: forming a graphene layer on a growth substrate; applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the said substrate; coupling the polyimide layer to the graphene layer on the growth substrate; and peeling the growth substrate from the graphene layer. L'invention concerne une méthode de formation d'un substrat de dispositif fonctionnalisé qui comprend les étapes consistant à : former une couche de graphène sur un substrat de croissance ; appliquer une couche de polyimide sur un substrat de verre, de vitrocéramique ou de céramique, un agent de couplage couplant la couche de polyimide audit substrat ; coupler la couche de polyimide à la couche de graphène sur le substrat de croissance ; et peler le substrat de croissance de la couche de graphène.
Bibliography:Application Number: WO2018US61518