HIGH-BRIGHTNESS LPP EUV LIGHT SOURCE

• Main Authors: SIDELNIKOV, Yury Viktorovich, ANTSIFEROV, Pavel Stanislavovich, YAKUSHEV, Oleg Feliksovich, LASH, Aleksandr Andreevich, ELLWI, Samir, GLUSHKOV, Denis, MEDVEDEV, Vyacheslav Valerievich, SEROGLAZOV, Pavel, VINOKHODOV, Aleksandr Yurievich, IVANOV, Vladimir Vitalievich, KRYVOKORYTOV, Mikhail Sergeyevich, KOSHELEV, Konstantin Nikolaevich, KRIVTSUN, Vladimir Mikhailovich
• Format: Patent
• Language: English; French
• Published: 21.12.2017
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES USING STIMULATED EMISSION; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GAMMA RAY OR X-RAY MICROSCOPES; IRRADIATION DEVICES; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; X-RAY TECHNIQUE

The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means...