TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD AND CLEANING METHOD
This treatment composition for chemical mechanical polishing is characterized by containing (A) at least one compound selected from the group consisting of compounds represented by general formula (1) or general formula (2), and (B) a water-soluble polymer having at least one functional group select...
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Format | Patent |
Language | English French Japanese |
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06.10.2016
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Abstract | This treatment composition for chemical mechanical polishing is characterized by containing (A) at least one compound selected from the group consisting of compounds represented by general formula (1) or general formula (2), and (B) a water-soluble polymer having at least one functional group selected from the group consisting of a carboxyl group, a sulfo group and an amino group. (In general formula (1), R1 represents a functional group selected from the group consisting of hydrocarbon groups having 1-10 carbon atoms and organic groups having a heteroatom and 1-20 carbon atoms.) (In general formula (2), R2 represents an organic group having 1-20 carbon atoms.)
L'invention concerne une composition de traitement pour le polissage mécano-chimique qui est caractérisée en ce qu'elle contient (A) au moins un composé choisi dans le groupe constitué des composés représentés par la formule générale (1) ou la formule générale (2), et (B) un polymère soluble dans l'eau ayant au moins un groupe fonctionnel choisi dans le groupe constitué d'un groupe carboxyle, d'un groupe sulfo et d'un groupe amino. (Dans la formule générale (1), R1 représente un groupe fonctionnel choisi dans le groupe constitué de groupes hydrocarbonés ayant 1 à 10 atomes de carbone et de groupes organiques ayant un hétéroatome et 1 à 20 atomes de carbone.) (Dans la formule générale (2), R2 représente un groupe organique ayant 1 à 20 atomes de carbone.)
本発明に係る化学機械研磨用処理組成物は、(A)下記一般式(1)および一般式(2)で表される化合物よりなる群から選択される少なくとも1種類以上の化合物、(B)カルボキシル基、スルホ基、およびアミノ基よりなる群から選択される少なくとも1種の官能基を有する水溶性高分子を含むことを特徴とする。(一般式(1)中、R1は炭素数1~10の炭化水素基およびヘテロ原子を有する炭素数1~20の有機基からなる群から選択されるいずれかの官能基を示す。)(一般式(2)中、R2は、炭素数1~20の有機基を示す。) |
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AbstractList | This treatment composition for chemical mechanical polishing is characterized by containing (A) at least one compound selected from the group consisting of compounds represented by general formula (1) or general formula (2), and (B) a water-soluble polymer having at least one functional group selected from the group consisting of a carboxyl group, a sulfo group and an amino group. (In general formula (1), R1 represents a functional group selected from the group consisting of hydrocarbon groups having 1-10 carbon atoms and organic groups having a heteroatom and 1-20 carbon atoms.) (In general formula (2), R2 represents an organic group having 1-20 carbon atoms.)
L'invention concerne une composition de traitement pour le polissage mécano-chimique qui est caractérisée en ce qu'elle contient (A) au moins un composé choisi dans le groupe constitué des composés représentés par la formule générale (1) ou la formule générale (2), et (B) un polymère soluble dans l'eau ayant au moins un groupe fonctionnel choisi dans le groupe constitué d'un groupe carboxyle, d'un groupe sulfo et d'un groupe amino. (Dans la formule générale (1), R1 représente un groupe fonctionnel choisi dans le groupe constitué de groupes hydrocarbonés ayant 1 à 10 atomes de carbone et de groupes organiques ayant un hétéroatome et 1 à 20 atomes de carbone.) (Dans la formule générale (2), R2 représente un groupe organique ayant 1 à 20 atomes de carbone.)
本発明に係る化学機械研磨用処理組成物は、(A)下記一般式(1)および一般式(2)で表される化合物よりなる群から選択される少なくとも1種類以上の化合物、(B)カルボキシル基、スルホ基、およびアミノ基よりなる群から選択される少なくとも1種の官能基を有する水溶性高分子を含むことを特徴とする。(一般式(1)中、R1は炭素数1~10の炭化水素基およびヘテロ原子を有する炭素数1~20の有機基からなる群から選択されるいずれかの官能基を示す。)(一般式(2)中、R2は、炭素数1~20の有機基を示す。) |
Author | ANDOU, Saki KAMO, Satoshi IIDA, Masashi FUJIYAMA, Hitoshi KAMEI, Yasutaka HAYAMA, Takahiro MITSUBOSHI, Ran SHINOMURA, Hisashi MITSUMOTO, Kiyotaka |
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DocumentTitleAlternate | COMPOSITION DE TRAITEMENT POUR LE POLISSAGE MÉCANO-CHIMIQUE, PROCÉDÉ DE POLISSAGE MÉCANO-CHIMIQUE ET PROCÉDÉ DE NETTOYAGE 化学機械研磨用処理組成物、化学機械研磨方法および洗浄方法 |
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SubjectTerms | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
Title | TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD AND CLEANING METHOD |
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