ION BEAM DEVICE
In order to provide an ion beam device that is exceptionally safe and stable even when a test sample is irradiated with hydrogen ions, this ion beam device is provided with: a vacuum container (115); a gas field ionization source (101) provided with an emitter tip (121), the gas field ionization sou...
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Format | Patent |
Language | English French Japanese |
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14.04.2016
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Abstract | In order to provide an ion beam device that is exceptionally safe and stable even when a test sample is irradiated with hydrogen ions, this ion beam device is provided with: a vacuum container (115); a gas field ionization source (101) provided with an emitter tip (121), the gas field ionization source (101) being disposed within the vacuum container (115); and a gas-supplying means (126) for supplying a gas to the emitter tip (121), wherein the gas-supplying means (126) has a mixed-gas container (140) filled with hydrogen gas and a gas for diluting the hydrogen gas so the hydrogen gas is at or below the explosive limit.
L'invention a pour objet de réaliser un dispositif à faisceau ionique qui est exceptionnellement sûr et stable, même lorsqu'un échantillon soumis à essai est irradié avec des ions d'hydrogène. Le dispositif à faisceau ionique selon l'invention comprend : un récipient sous vide (115); une source d'ionisation de champ de gaz (101) pourvue d'une pointe d'émetteur (121), la source d'ionisation de champ de gaz (101) étant disposée à l'intérieur du récipient sous vide (115); et des moyens d'alimentation en gaz (126) destinés à fournir un gaz à la pointe d'émetteur (121). Les moyens d'alimentation en gaz (126) comprennent un récipient à mélange gazeux (140) rempli d'hydrogène gazeux et d'un gaz destiné à diluer l'hydrogène gazeux de sorte que l'hydrogène gazeux se trouve à la limite explosive ou au-dessous de celle-ci.
水素イオンを試料に照射する場合であっても、安全性・安定性に優れたイオンビーム装置を提供するために、真空容器(115)と、真空容器(115)内に設置され、エミッタティップ(121)を備えたガス電界電離イオン源(101)と、エミッタティップ(121)にガスを供給するガス供給手段(126)と、を備えるイオンビーム装置において、ガス供給手段(126)は、水素ガス及び水素ガスを爆発下限以下に希釈するためのガスが充填された混合ガス容器(140)を有する。 |
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AbstractList | In order to provide an ion beam device that is exceptionally safe and stable even when a test sample is irradiated with hydrogen ions, this ion beam device is provided with: a vacuum container (115); a gas field ionization source (101) provided with an emitter tip (121), the gas field ionization source (101) being disposed within the vacuum container (115); and a gas-supplying means (126) for supplying a gas to the emitter tip (121), wherein the gas-supplying means (126) has a mixed-gas container (140) filled with hydrogen gas and a gas for diluting the hydrogen gas so the hydrogen gas is at or below the explosive limit.
L'invention a pour objet de réaliser un dispositif à faisceau ionique qui est exceptionnellement sûr et stable, même lorsqu'un échantillon soumis à essai est irradié avec des ions d'hydrogène. Le dispositif à faisceau ionique selon l'invention comprend : un récipient sous vide (115); une source d'ionisation de champ de gaz (101) pourvue d'une pointe d'émetteur (121), la source d'ionisation de champ de gaz (101) étant disposée à l'intérieur du récipient sous vide (115); et des moyens d'alimentation en gaz (126) destinés à fournir un gaz à la pointe d'émetteur (121). Les moyens d'alimentation en gaz (126) comprennent un récipient à mélange gazeux (140) rempli d'hydrogène gazeux et d'un gaz destiné à diluer l'hydrogène gazeux de sorte que l'hydrogène gazeux se trouve à la limite explosive ou au-dessous de celle-ci.
水素イオンを試料に照射する場合であっても、安全性・安定性に優れたイオンビーム装置を提供するために、真空容器(115)と、真空容器(115)内に設置され、エミッタティップ(121)を備えたガス電界電離イオン源(101)と、エミッタティップ(121)にガスを供給するガス供給手段(126)と、を備えるイオンビーム装置において、ガス供給手段(126)は、水素ガス及び水素ガスを爆発下限以下に希釈するためのガスが充填された混合ガス容器(140)を有する。 |
Author | SHICHI HIROYASU MUTO HIROYUKI MATSUBARA SHINICHI KAWANAMI YOSHIMI |
Author_xml | – fullname: SHICHI HIROYASU – fullname: MATSUBARA SHINICHI – fullname: MUTO HIROYUKI – fullname: KAWANAMI YOSHIMI |
BookMark | eNrjYmDJy89L5WTg9_T3U3BydfRVcHEN83R25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgaGZgamZiYmZo6GxsSpAgD-Wh-T |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
DocumentTitleAlternate | イオンビーム装置 DISPOSITIF À FAISCEAU IONIQUE |
ExternalDocumentID | WO2016056446A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_WO2016056446A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:02:11 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English French Japanese |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_WO2016056446A13 |
Notes | Application Number: WO2015JP77780 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160414&DB=EPODOC&CC=WO&NR=2016056446A1 |
ParticipantIDs | epo_espacenet_WO2016056446A1 |
PublicationCentury | 2000 |
PublicationDate | 20160414 |
PublicationDateYYYYMMDD | 2016-04-14 |
PublicationDate_xml | – month: 04 year: 2016 text: 20160414 day: 14 |
PublicationDecade | 2010 |
PublicationYear | 2016 |
RelatedCompanies | HITACHI HIGH-TECHNOLOGIES CORPORATION |
RelatedCompanies_xml | – name: HITACHI HIGH-TECHNOLOGIES CORPORATION |
Score | 3.148267 |
Snippet | In order to provide an ion beam device that is exceptionally safe and stable even when a test sample is irradiated with hydrogen ions, this ion beam device is... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
Title | ION BEAM DEVICE |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160414&DB=EPODOC&locale=&CC=WO&NR=2016056446A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQMTMyAbaDE411jcxTTXSBpaSZbqJBSppuYkqimYG5uYFpMnjJv6-fmUeoiVeEaQQTQw5sLwz4nNBy8OGIwByVDMzvJeDyugAxiOUCXltZrJ-UCRTKt3cLsXVRg_aODc0MTAxN1FycbF0D_F38ndWcnYH9NjW_IIicKbDyN3ME9pVYQQ1p0En7rmFOoH0pBciVipsgA1sA0Ly8EiEGpqxEYQZOZ9jda8IMHL7QKW8gE5r7ikUY-IHlnoKTq6OvgotrmKezqyiDsptriLOHLtDkeLhH4sP9kZ1hLMbAAuzip0owKIBm-xKTQad7AWv35BQji6QUs9SUNNBBN4lJKRZJkgwy-EySwi8tzcAF4oLmQAxNZBhYSopKU2WBVWlJkhw4BACNZXMS |
link.rule.ids | 230,309,786,891,25594,76904 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQMTMyAbaDE411jcxTTXSBpaSZbqJBSppuYkqimYG5uYFpMnjJv6-fmUeoiVeEaQQTQw5sLwz4nNBy8OGIwByVDMzvJeDyugAxiOUCXltZrJ-UCRTKt3cLsXVRg_aODc0MTAxN1FycbF0D_F38ndWcnYH9NjW_IIicKbDyN3ME9pVYzYGdQtBJ-65hTqB9KQXIlYqbIANbANC8vBIhBqasRGEGTmfY3WvCDBy-0ClvIBOa-4pFGPiB5Z6Ck6ujr4KLa5ins6sog7Kba4izhy7Q5Hi4R-LD_ZGdYSzGwALs4qdKMCiAZvsSk0GnewFr9-QUI4ukFLPUlDTQQTeJSSkWSZIMMvhMksIvLc_A6RHi6xPv4-nnLc3ABZICzYcYmsgwsJQUlabKAqvVkiQ5cGgAABRwdf0 |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=ION+BEAM+DEVICE&rft.inventor=SHICHI+HIROYASU&rft.inventor=MATSUBARA+SHINICHI&rft.inventor=MUTO+HIROYUKI&rft.inventor=KAWANAMI+YOSHIMI&rft.date=2016-04-14&rft.externalDBID=A1&rft.externalDocID=WO2016056446A1 |