COATING METHOD AND COATING DEVICE

• Main Authors: GOTO, TETSUYA, FUJIMORI, SHIGEO, MURASE, SEIICHIRO, ENZAKI, SATOSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 03.10.2013
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE; TRANSPORTING

Provided are a coating method and coating device which can handle arbitrary coating shapes while maintaining the high pattern coating accuracy of conventional slit coating methods and stripe coating methods. This coating method involves a bead forming step for discharging a coating liquid from the discharge port of a nozzle to form beads of the coating liquid between the substrate and the discharge port, and a coating step for moving the nozzle relatively to the substrate to coat the substrate with the coating liquid. In the coating step, the coating end position of the coating liquid on the substrate is adjusted by changing the interval between the substrate and the discharge port of the nozzle. Cette invention concerne un procédé de revêtement et un dispositif de revêtement permettant de gérer des formes de revêtement arbitraires tout en préservant la haute précision de revêtement des procédés de revêtement classiques par fentes et en bandes. Ledit procédé de revêtement comprend une étape de formation de perles consistant à distribuer un liquide de revêtement à partir d'un orifice de projection d'une buse de façon à former des perles de liquide de revêtement entre le substrat et l'orifice de projection, et une étape de revêtement consistant à déplacer la buse par rapport au substrat de façon à enduire le substrat du liquide de revêtement. A l'étape de revêtement, la position finale de revêtement du liquide de revêtement sur le substrat est réglée par modification de l'espace entre le substrat et l'orifice de projection de la buse.