OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION
The invention relates to an optical assembly, in particular a projection exposure apparatus for EUV lithography, comprising: a beam generating system for generating radiation (6) at an operating wavelength,at least one optical element (13, 14) which is subjected to the radiation (6) and is arranged...
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Main Authors | , , |
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Format | Patent |
Language | English French |
Published |
24.01.2013
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Subjects | |
Online Access | Get full text |
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