MULTIPLE FREQUENCY POWER FOR PLASMA CHAMBER ELECTRODE

• Main Authors: TANAKA, TSUTOMU, KUDELA, JOZEF, HAMMOND, EDWARD, P., IV, BOITNOTT, CHRISTOPHER
• Format: Patent
• Language: English; French
• Published: 19.04.2012
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES

First through fifth RF power signals are respectively coupled to first through fifth RF connection points on an electrode of a plasma chamber. The first, second and third RF power signals have distinct first, second and third frequencies, respectively. The second and fourth RF power signals have the...