POLYPROPYLENE RESIN COMPOSITION FOR MICROPOROUS FILM FORMATION

Provided is a polypropylene resin composition for microporous film formation having excellent heat resistance and a low heat-shrinkage ratio. This polypropylene resin composition for microporous film formation has as an essential component a propylene monopolymer (A) which meets the following condit...

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Main Authors TSUNORI, RYOICHI, TAMURA, SATOSHI, ITAKURA, KEITA, HASHIZUME, SATOSHI
Format Patent
LanguageEnglish
French
Japanese
Published 15.07.2010
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Abstract Provided is a polypropylene resin composition for microporous film formation having excellent heat resistance and a low heat-shrinkage ratio. This polypropylene resin composition for microporous film formation has as an essential component a propylene monopolymer (A) which meets the following conditions (1)-(4) and (7). (1) The limiting viscosity [?] is 1 dl/g or greater but less than 7 dl/g. (2) The mesopentad fraction is in the range of 94.0-99.5%. (3) When the temperature increases, the integral elution quantity up to 100°C is 10% or less. (4) The melting point is 153-167°C. (7) For the elution temperature-elution quantity curve, the peak top temperature of the maximum peak is 105-130°C and the half-value width of said peak is 7.0°C or less. L'invention porte sur une composition de résine de polypropylène pour la formation de films microporeux ayant une excellente résistance à la chaleur et un faible taux de retrait thermique. Cette composition de résine de polypropylène pour la formation de films microporeux a comme composant essentiel un homopolymère du propylène (A) qui satisfait aux conditions (1) à (4) et (7) suivantes. (1) La viscosité intrinsèque [?] est supérieure ou égale à 1 dl/g mais inférieure à 7 dl/g. (2) La fraction de mésopentade est comprise dans la plage de 94,0 à 99,5 %. (3) Lorsque la température augmente, la quantité éluée intégrale jusqu'à 100°C est inférieure ou égale à 10 %. (4) Le point de fusion est de 153 à 167°C. (7) Pour la courbe de température d'élution - quantité éluée, la température au sommet du pic maximal est de 105 à 130°C et la largeur à mi-hauteur dudit pic est inférieure ou égale à 7,0°C.
AbstractList Provided is a polypropylene resin composition for microporous film formation having excellent heat resistance and a low heat-shrinkage ratio. This polypropylene resin composition for microporous film formation has as an essential component a propylene monopolymer (A) which meets the following conditions (1)-(4) and (7). (1) The limiting viscosity [?] is 1 dl/g or greater but less than 7 dl/g. (2) The mesopentad fraction is in the range of 94.0-99.5%. (3) When the temperature increases, the integral elution quantity up to 100°C is 10% or less. (4) The melting point is 153-167°C. (7) For the elution temperature-elution quantity curve, the peak top temperature of the maximum peak is 105-130°C and the half-value width of said peak is 7.0°C or less. L'invention porte sur une composition de résine de polypropylène pour la formation de films microporeux ayant une excellente résistance à la chaleur et un faible taux de retrait thermique. Cette composition de résine de polypropylène pour la formation de films microporeux a comme composant essentiel un homopolymère du propylène (A) qui satisfait aux conditions (1) à (4) et (7) suivantes. (1) La viscosité intrinsèque [?] est supérieure ou égale à 1 dl/g mais inférieure à 7 dl/g. (2) La fraction de mésopentade est comprise dans la plage de 94,0 à 99,5 %. (3) Lorsque la température augmente, la quantité éluée intégrale jusqu'à 100°C est inférieure ou égale à 10 %. (4) Le point de fusion est de 153 à 167°C. (7) Pour la courbe de température d'élution - quantité éluée, la température au sommet du pic maximal est de 105 à 130°C et la largeur à mi-hauteur dudit pic est inférieure ou égale à 7,0°C.
Author TSUNORI, RYOICHI
ITAKURA, KEITA
TAMURA, SATOSHI
HASHIZUME, SATOSHI
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DocumentTitleAlternate COMPOSITION DE RÉSINE DE POLYPROPYLÈNE POUR LA FORMATION DE FILMS MICROPOREUX
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RelatedCompanies PRIME POLYMER CO., LTD
TSUNORI, RYOICHI
ITAKURA, KEITA
TAMURA, SATOSHI
MITSUI CHEMICALS, INC
HASHIZUME, SATOSHI
RelatedCompanies_xml – name: MITSUI CHEMICALS, INC
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– name: TAMURA, SATOSHI
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Snippet Provided is a polypropylene resin composition for microporous film formation having excellent heat resistance and a low heat-shrinkage ratio. This...
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SourceType Open Access Repository
SubjectTerms AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
BASIC ELECTRIC ELEMENTS
CAPACITORS
CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRICITY
GENERAL PROCESSES OF COMPOUNDING
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
WORKING-UP
Title POLYPROPYLENE RESIN COMPOSITION FOR MICROPOROUS FILM FORMATION
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