ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND ?-DIKETONE COMPOUND

Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding...

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Main Authors SATO, NAOMI, KIMIJIMA, KOICHI, YAMADA, TAKASHI
Format Patent
LanguageEnglish
French
Japanese
Published 05.02.2009
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Abstract Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding (B) a compound having a ß-diketone moiety or a compound having a ß-ketoester group to a (meth)acryloyl group of (A) a compound having two or more (meth)acryloyl groups and a hydroxy group. As the compound having a ß-diketone moiety, a novel compound that is a ß-diketone compound represented by the general formula (I) below is preferably used. (In the formula (I), R1 represents an alkyl group having 1-20 carbon atoms; R2 represents R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms or the like; a represents an integer of 0-3; and b represents an integer of 0-4.) L'invention concerne une composition de résine photosensible développable par des alcalis contenant (J) un composé insaturé photopolymérisable ayant une structure qui est obtenue par une réaction d'estérification entre (C) un anhydride d'acide polybasique et un groupe hydroxy d'un produit de réaction qui est obtenu en ajoutant (B) un composé ayant un groupe caractéristique de ß-dicétone ou un composé ayant un groupe ß-céto-ester à un groupe (méth)acryloyle de (A) un composé ayant deux groupes (méth)acryloyle ou plus et un groupe hydroxy. En tant que composé ayant un groupe caractéristique ß-dicétone, un nouveau composé qui est un composé ß-dicétone représenté par la formule générale (I) ci-dessous est de préférence utilisé. (Dans la formule (I), R1 représente un groupe alkyle ayant 1 à 20 atomes de carbone; R2 représente R11, OR11, COR11, SR11, CONR12R13 ou CN; R11, R12 et R13 représentent indépendamment un atome d'hydrogène, un groupe alkyle ayant 1 à 20 atomes de carbone ou similaires; a représente un entier de 0 à 3; et b représente un entier de of 0 à 4.)
AbstractList Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding (B) a compound having a ß-diketone moiety or a compound having a ß-ketoester group to a (meth)acryloyl group of (A) a compound having two or more (meth)acryloyl groups and a hydroxy group. As the compound having a ß-diketone moiety, a novel compound that is a ß-diketone compound represented by the general formula (I) below is preferably used. (In the formula (I), R1 represents an alkyl group having 1-20 carbon atoms; R2 represents R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms or the like; a represents an integer of 0-3; and b represents an integer of 0-4.) L'invention concerne une composition de résine photosensible développable par des alcalis contenant (J) un composé insaturé photopolymérisable ayant une structure qui est obtenue par une réaction d'estérification entre (C) un anhydride d'acide polybasique et un groupe hydroxy d'un produit de réaction qui est obtenu en ajoutant (B) un composé ayant un groupe caractéristique de ß-dicétone ou un composé ayant un groupe ß-céto-ester à un groupe (méth)acryloyle de (A) un composé ayant deux groupes (méth)acryloyle ou plus et un groupe hydroxy. En tant que composé ayant un groupe caractéristique ß-dicétone, un nouveau composé qui est un composé ß-dicétone représenté par la formule générale (I) ci-dessous est de préférence utilisé. (Dans la formule (I), R1 représente un groupe alkyle ayant 1 à 20 atomes de carbone; R2 représente R11, OR11, COR11, SR11, CONR12R13 ou CN; R11, R12 et R13 représentent indépendamment un atome d'hydrogène, un groupe alkyle ayant 1 à 20 atomes de carbone ou similaires; a représente un entier de 0 à 3; et b représente un entier de of 0 à 4.)
Author YAMADA, TAKASHI
KIMIJIMA, KOICHI
SATO, NAOMI
Author_xml – fullname: SATO, NAOMI
– fullname: KIMIJIMA, KOICHI
– fullname: YAMADA, TAKASHI
BookMark eNrjYmDJy89L5WTwdvQBIk9dF9cwVx__AEcnH1eFAA__EP9gV79gzxDPMFeFINdgTz8FZ3_fAH-QiL-fgqOfi4K9rount2uIv58rRCrUz4WHgTUtMac4lRdKczMou7mGOHvophbkx6cWFyQmp-allsSH-xsZGFgaGJobmJk4GhoTpwoAnt8wqA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
DocumentTitleAlternate COMPOSITION DE RÉSINE PHOTOSENSIBLE DÉVELOPPABLE PAR DES ALCALIS ET COMPOSÉ DE ?-DICÉTONE
ExternalDocumentID WO2009017064A1
GroupedDBID EVB
ID FETCH-epo_espacenet_WO2009017064A13
IEDL.DBID EVB
IngestDate Fri Jul 19 15:08:37 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
French
Japanese
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_WO2009017064A13
Notes Application Number: WO2008JP63423
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090205&DB=EPODOC&CC=WO&NR=2009017064A1
ParticipantIDs epo_espacenet_WO2009017064A1
PublicationCentury 2000
PublicationDate 20090205
PublicationDateYYYYMMDD 2009-02-05
PublicationDate_xml – month: 02
  year: 2009
  text: 20090205
  day: 05
PublicationDecade 2000
PublicationYear 2009
RelatedCompanies YAMADA, TAKASHI
KIMIJIMA, KOICHI
ADEKA CORPORATION
SATO, NAOMI
RelatedCompanies_xml – name: YAMADA, TAKASHI
– name: KIMIJIMA, KOICHI
– name: SATO, NAOMI
– name: ADEKA CORPORATION
Score 2.8166747
Snippet Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
Title ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND ?-DIKETONE COMPOUND
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090205&DB=EPODOC&locale=&CC=WO&NR=2009017064A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8Q_HxT1PiBZolmb42MrXM-EDLWEibQLjKQN7KNLtEYIDLjv287NuWJpE93SdNec7273t2vAA-2LZ4sIQTCRhohC0dzFDWaAs2NRDjCMSzsqEbhIbN7Y-tliqcV-Cx7YXKc0J8cHFFqVCL1Pcvv69X_IxbJayvXj_G7JC3b3bBF9DI6fpbeD9ZJp0UDTrine56M23T2uuEpqBjLlbHSnnKkFdI-nXRUX8pq26h0T2A_kPMtslOofEQ1OPLKv9dqcDgsUt41OMhrNJO1JBZ6uD6DvjuQw0fFF5puZ0C1oMdDPqJs5If-hGpSsj7TPD4MuKJwprmMaG1E_D4NOaMb1piRc7jv0tDrIbm-2Z84Zm98ezPmBVQXy4W4VFVKaYJTo2njWMHAm3FsC0cehsrlmamVXkF910zXu9k3cLzJpDRRA9ehmn19i1tpkLP4LpfjLwCah8g
link.rule.ids 230,309,786,891,25594,76906
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8Q_MA3RQ0q6hLN3hoZrGM-EDLWkU22dpGBvJFtdInGAJEZ_33bAcoTSZ_ukqa95np3vbtfAR4Ng7d1zjnCWhYjHcczFDeaHM20lJvc1HRsykbhgBruSH-Z4EkJPre9MAVO6E8Bjig0KhX6nhf39fL_EYsUtZWrp-RdkBbdftQh6jY6fhbeD1ZJr-OEjDBbtW0Rt6n0dc2TUDG6JWKlg7bE55XO07gn-1KWu0alfwqHoZhvnp9B6SOuQsXe_r1WheNgk_KuwlFRo5muBHGjh6tzGFi-GB7afKFp9XxHCV0WsaFDh17kjR1FSNajis2CkEkKo4pFidJFxBs4EaPOmjWi5AIe-k5ku0isb_onjukb291M6xLK88Wc12SVUpbiTGsaOJEw8K0kMbgpDkPm8lqZnl1Bfd9M1_vZ91Bxo8Cf-h4d3MDJOqvSRA1ch3L-9c1vhXHOk7tCpr-DKYq1
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=ALKALI-DEVELOPABLE+PHOTOSENSITIVE+RESIN+COMPOSITION+AND+%3F-DIKETONE+COMPOUND&rft.inventor=SATO%2C+NAOMI&rft.inventor=KIMIJIMA%2C+KOICHI&rft.inventor=YAMADA%2C+TAKASHI&rft.date=2009-02-05&rft.externalDBID=A1&rft.externalDocID=WO2009017064A1