ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND ?-DIKETONE COMPOUND
Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding...
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Format | Patent |
Language | English French Japanese |
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05.02.2009
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Abstract | Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding (B) a compound having a ß-diketone moiety or a compound having a ß-ketoester group to a (meth)acryloyl group of (A) a compound having two or more (meth)acryloyl groups and a hydroxy group. As the compound having a ß-diketone moiety, a novel compound that is a ß-diketone compound represented by the general formula (I) below is preferably used. (In the formula (I), R1 represents an alkyl group having 1-20 carbon atoms; R2 represents R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms or the like; a represents an integer of 0-3; and b represents an integer of 0-4.)
L'invention concerne une composition de résine photosensible développable par des alcalis contenant (J) un composé insaturé photopolymérisable ayant une structure qui est obtenue par une réaction d'estérification entre (C) un anhydride d'acide polybasique et un groupe hydroxy d'un produit de réaction qui est obtenu en ajoutant (B) un composé ayant un groupe caractéristique de ß-dicétone ou un composé ayant un groupe ß-céto-ester à un groupe (méth)acryloyle de (A) un composé ayant deux groupes (méth)acryloyle ou plus et un groupe hydroxy. En tant que composé ayant un groupe caractéristique ß-dicétone, un nouveau composé qui est un composé ß-dicétone représenté par la formule générale (I) ci-dessous est de préférence utilisé. (Dans la formule (I), R1 représente un groupe alkyle ayant 1 à 20 atomes de carbone; R2 représente R11, OR11, COR11, SR11, CONR12R13 ou CN; R11, R12 et R13 représentent indépendamment un atome d'hydrogène, un groupe alkyle ayant 1 à 20 atomes de carbone ou similaires; a représente un entier de 0 à 3; et b représente un entier de of 0 à 4.) |
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AbstractList | Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding (B) a compound having a ß-diketone moiety or a compound having a ß-ketoester group to a (meth)acryloyl group of (A) a compound having two or more (meth)acryloyl groups and a hydroxy group. As the compound having a ß-diketone moiety, a novel compound that is a ß-diketone compound represented by the general formula (I) below is preferably used. (In the formula (I), R1 represents an alkyl group having 1-20 carbon atoms; R2 represents R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms or the like; a represents an integer of 0-3; and b represents an integer of 0-4.)
L'invention concerne une composition de résine photosensible développable par des alcalis contenant (J) un composé insaturé photopolymérisable ayant une structure qui est obtenue par une réaction d'estérification entre (C) un anhydride d'acide polybasique et un groupe hydroxy d'un produit de réaction qui est obtenu en ajoutant (B) un composé ayant un groupe caractéristique de ß-dicétone ou un composé ayant un groupe ß-céto-ester à un groupe (méth)acryloyle de (A) un composé ayant deux groupes (méth)acryloyle ou plus et un groupe hydroxy. En tant que composé ayant un groupe caractéristique ß-dicétone, un nouveau composé qui est un composé ß-dicétone représenté par la formule générale (I) ci-dessous est de préférence utilisé. (Dans la formule (I), R1 représente un groupe alkyle ayant 1 à 20 atomes de carbone; R2 représente R11, OR11, COR11, SR11, CONR12R13 ou CN; R11, R12 et R13 représentent indépendamment un atome d'hydrogène, un groupe alkyle ayant 1 à 20 atomes de carbone ou similaires; a représente un entier de 0 à 3; et b représente un entier de of 0 à 4.) |
Author | YAMADA, TAKASHI KIMIJIMA, KOICHI SATO, NAOMI |
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DocumentTitleAlternate | COMPOSITION DE RÉSINE PHOTOSENSIBLE DÉVELOPPABLE PAR DES ALCALIS ET COMPOSÉ DE ?-DICÉTONE |
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RelatedCompanies | YAMADA, TAKASHI KIMIJIMA, KOICHI ADEKA CORPORATION SATO, NAOMI |
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Snippet | Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND ?-DIKETONE COMPOUND |
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