TECHNIQUES FOR LOW TEMPERATURE ION IMPLANTATION

• Main Authors: MUKA, RICHARD, S, LISCHER, D., JEFFREY, ENGLAND, JONATHAN, GERALD
• Format: Patent
• Language: English; French
• Published: 12.09.2008
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Techniques for low-temperature ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for low-temperature ion implantation. The apparatus may comprise a wafer support mechanism to hold a wafer during ion implantation and to facilitate m...