SUBSTRATE WITH PARTITION PATTERN AND PROCESS FOR PRODUCING THE SAME

A substrate which has a partition pattern and on which a colored layer free from color mixing or blind-spot failures and having flatness and evenness of the pixels can be formed; and a process for producing the substrate. The substrate having a partition pattern comprises a base and a partition patt...

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Bibliographic Details
Main Authors KUBO, YUJI, MIURA, HIROYUKI, IKESA, TAKESHI, AOKI, EISHI, KAMINAGA, JUNICHI
Format Patent
LanguageEnglish
French
Japanese
Published 27.12.2007
Subjects
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Summary:A substrate which has a partition pattern and on which a colored layer free from color mixing or blind-spot failures and having flatness and evenness of the pixels can be formed; and a process for producing the substrate. The substrate having a partition pattern comprises a base and a partition pattern formed in a given position on the base and made of a material comprising a fluorine compound. When the upper surface of the partition is examined by anion analysis with a time-of-flight secondary ion mass spectrometer (TOF-SIMS), the proportion of the detected intensity of F-fragment ions (M/Z=19) to the detected intensity of all anions is 25-60%. La présente invention concerne un substrat qui possède une cloison, sur lequel on peut former une couche colorée qui ne présente pas d'erreurs de mélange de couleurs ou de tache d'ombre, et qui possède des pixels plans et réguliers. La présente invention porte aussi sur un procédé permettant de produire le substrat. Le substrat pourvu d'une cloison comprend une base et une cloison formée sur la base, suivant une position donnée, et se compose d'un matériau contenant un composé fluor. Lorsque la surface supérieure de la cloison est examinée par analyse anionique avec un spectromètre de masse d'ions secondaires à temps de vol (TOF-SIMS), le rapport de l'intensité détectée d'ions fragments F (M/Z=19) sur l'intensité détectée de tous les anions est compris entre 25 et 60 %.
Bibliography:Application Number: WO2007JP62321