PLASMA REACTOR WITH A DYNAMICALLY ADJUSTABLE PLASMA SOURCE POWER APPLICATOR

• Main Authors: GRIMBERGEN, MICHAEL, N, PANAYIL, SHEEBA, J, BIVENS, DARIN, IBRAHIM, IBRAHIM, M, KUMAR, AJAY, KOCH, RENEE, LEWINGTON, RICHARD, CHANDRACHOOD, MADHAVI, R
• Format: Patent
• Language: English; French
• Published: 15.11.2007
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE

A plasma reactor for processing a workpiece includes a process chamber having an enclosure including a ceiling and having a vertical axis of symmetry generally perpendicular to the ceiling, a workpiece support pedestal inside the chamber and generally facing the ceiling, process gas injection appara...