PHOTOSENSITIVE COMPOSITION CONTAINING ORGANIC FINE PARTICLES

This invention provides a photosensitive composition, which has low light scattering loss and can permanently form a hologram with high diffraction efficiency, and a method for pattern formation using the composition. The photosensitive composition is used for pattern formation by pattern-wise expos...

Full description

Saved in:
Bibliographic Details
Main Authors HIDAKA, MOTOHIKO, TOMITA, YASUO, ODOI, KEISUKE, FURUSHIMA, KOUJI, AKIMOTO, KAZUHIKO, CHIKAMA, KATSUMI
Format Patent
LanguageEnglish
French
Japanese
Published 28.09.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHIC PROCESSES OR APPARATUS
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:This invention provides a photosensitive composition, which has low light scattering loss and can permanently form a hologram with high diffraction efficiency, and a method for pattern formation using the composition. The photosensitive composition is used for pattern formation by pattern-wise exposure and is characterized by comprising (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles. L'invention concerne une composition photosensible, présentant de faibles pertes en diffusion de la lumière et pouvant former de manière permanente un hologramme ayant un rendement de diffraction élevé ; ainsi qu'une méthode de formation d'un motif en utilisant cette composition. La composition photosensible est utilisée pour former des motifs par une exposition en fonction du motif, et est caractérisée en ce qu'elle comprend (a) un composé polymérisable, (b) un initiateur de photopolymérisation, et (c) de fines particules organiques.
Bibliography:Application Number: WO2006JP305246