FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION

Disclosed is a fluorine-containing polymer which has a functional group and is highly transparent to a wide wavelength range. Also disclosed are a resist composition composed of such a fluorine-containing polymer and a resist protective film composition. Specifically disclosed is a fluorine-containi...

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Main Authors TAKEBE, YOKO, SASAKI, TAKASHI, YOKOKOJI, OSAMU, EDA, MASATAKA
Format Patent
LanguageEnglish
French
Japanese
Published 02.02.2006
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Abstract Disclosed is a fluorine-containing polymer which has a functional group and is highly transparent to a wide wavelength range. Also disclosed are a resist composition composed of such a fluorine-containing polymer and a resist protective film composition. Specifically disclosed is a fluorine-containing polymer having a monomer unit obtained by ring-forming polymerization of a fluorine-containing diene and represented by the following formula (1): CF2=CFCF2C(CF3)(OR1)-(CH2)nCR2=CHR3. [In the formula (1), R1 represents a hydrogen atom, an alkyl group having 20 or less carbon atoms or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 represents a hydrogen atom or an alkyl group having 20 or less carbon atoms), R2 and R3 independently represent a hydrogen atom or an alkyl group having 12 or less carbon atoms, and n represents 0 or 2. When n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.] Polymère contenant du fluor ayant un groupe fonctionnel et étant hautement transparent pour un large éventail de longueurs d'ondes. Cette invention concerne également une composition de réserve composée de ce polymère contenant du fluor, ainsi qu'une composition de film protecteur de réserve. Plus spécifiquement, cette invention concerne un polymère contenant du fluor, ayant une unité monomère obtenue par polymérisation avec cyclisation d'un diène contenant du fluor, et est représentée par la formule suivante (1) : CF2=CFCF2C(CF3)(OR1)-(CH2)nCR2=CHR3. [Dans la formule (1), R1 représente un atome hydrogène, un groupe alkyl ayant au plus 20 atomes de carbone ou (CH2)aCOOR4 (où a est égal à 0 ou à 1, R4 représente un atome hydrogène ou un groupe alkyl ayant au plus 20 atomes de carbone), R2 et R3 représentent indépendamment un atome hydrogène ou un groupe alkyl ayant au plus 12 atomes de carbone, et n est égal à 0 ou à 2. Quand n est égal à 0, au moins un élément parmi R1, R2 et R3 n'est pas un atome hydrogène.]
AbstractList Disclosed is a fluorine-containing polymer which has a functional group and is highly transparent to a wide wavelength range. Also disclosed are a resist composition composed of such a fluorine-containing polymer and a resist protective film composition. Specifically disclosed is a fluorine-containing polymer having a monomer unit obtained by ring-forming polymerization of a fluorine-containing diene and represented by the following formula (1): CF2=CFCF2C(CF3)(OR1)-(CH2)nCR2=CHR3. [In the formula (1), R1 represents a hydrogen atom, an alkyl group having 20 or less carbon atoms or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 represents a hydrogen atom or an alkyl group having 20 or less carbon atoms), R2 and R3 independently represent a hydrogen atom or an alkyl group having 12 or less carbon atoms, and n represents 0 or 2. When n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.] Polymère contenant du fluor ayant un groupe fonctionnel et étant hautement transparent pour un large éventail de longueurs d'ondes. Cette invention concerne également une composition de réserve composée de ce polymère contenant du fluor, ainsi qu'une composition de film protecteur de réserve. Plus spécifiquement, cette invention concerne un polymère contenant du fluor, ayant une unité monomère obtenue par polymérisation avec cyclisation d'un diène contenant du fluor, et est représentée par la formule suivante (1) : CF2=CFCF2C(CF3)(OR1)-(CH2)nCR2=CHR3. [Dans la formule (1), R1 représente un atome hydrogène, un groupe alkyl ayant au plus 20 atomes de carbone ou (CH2)aCOOR4 (où a est égal à 0 ou à 1, R4 représente un atome hydrogène ou un groupe alkyl ayant au plus 20 atomes de carbone), R2 et R3 représentent indépendamment un atome hydrogène ou un groupe alkyl ayant au plus 12 atomes de carbone, et n est égal à 0 ou à 2. Quand n est égal à 0, au moins un élément parmi R1, R2 et R3 n'est pas un atome hydrogène.]
Author TAKEBE, YOKO
EDA, MASATAKA
YOKOKOJI, OSAMU
SASAKI, TAKASHI
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DocumentTitleAlternate COMPOSÉ CONTENANT DU FLUOR, POLYMÈRE CONTENANT DU FLUOR, COMPOSITION DE RÉSERVE ET COMPOSITION DE FILM PROTECTEUR DE RÉSERVE
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RelatedCompanies TAKEBE, YOKO
EDA, MASATAKA
YOKOKOJI, OSAMU
SASAKI, TAKASHI
ASAHI GLASS COMPANY, LIMITED
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Snippet Disclosed is a fluorine-containing polymer which has a functional group and is highly transparent to a wide wavelength range. Also disclosed are a resist...
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SubjectTerms ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
Title FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION
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