SACRIFICIAL METAL LINER FOR COPPER INTERCONNECTS

• Main Authors: SIMON, ANDREW, H, COONEY, EDWARD, C., III, STAMPER, ANTHONY, K, MARINO, JEFFREY, R, GEFFKEN, ROBERT, M
• Format: Patent
• Language: English; French
• Published: 19.08.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A semiconductor device which includes an improved liner structure formed in a via (5) having extended sidewall portions and a bottom (8) penetrating a metal liner (7). The liner structure includes two liner layers, the first (6) being on the via sidewalls, but not the bottom, and the second being (9...