Abstract An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc, magnetic disc, plasma display, liquid crystal, or LSI photomask. The abrasive is composed of abrasive particles such that the ratio D95/D50 of the 95% cumulative average diameter (D95) in terms of volume to the 50% cumulative average diameter (D50) in terms of volume lies in the range from 1.2 to 3.0. Therefore high speed of high precision surface grinding is achieved. L'invention porte sur un abrasif servant au ponçage de précision de substrats utilisés dans les industries optiques et électroniques tels que des substrats de verre pour lentilles, des disques optiques, des disques magnétiques, des écrans à plasma, des cristaux liquides ou des photomasques en LSI. Ledit abrasif comprend des particules abrasives telles que le rapport D95/D50 du diamètre cumulatif volumique moyen de 95 % (D95) par rapport au diamètre cumulatif volumique moyen de 50 % (D50) se situe entre 1,2 et 3,0, ce qui permet d'atteindre des vitesses élevées de ponçage.
AbstractList An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc, magnetic disc, plasma display, liquid crystal, or LSI photomask. The abrasive is composed of abrasive particles such that the ratio D95/D50 of the 95% cumulative average diameter (D95) in terms of volume to the 50% cumulative average diameter (D50) in terms of volume lies in the range from 1.2 to 3.0. Therefore high speed of high precision surface grinding is achieved. L'invention porte sur un abrasif servant au ponçage de précision de substrats utilisés dans les industries optiques et électroniques tels que des substrats de verre pour lentilles, des disques optiques, des disques magnétiques, des écrans à plasma, des cristaux liquides ou des photomasques en LSI. Ledit abrasif comprend des particules abrasives telles que le rapport D95/D50 du diamètre cumulatif volumique moyen de 95 % (D95) par rapport au diamètre cumulatif volumique moyen de 50 % (D50) se situe entre 1,2 et 3,0, ce qui permet d'atteindre des vitesses élevées de ponçage.
Author SAEGUSA, HIROSHI
IMAI, FUMIO
MASUDA, TOMOYUKI
ITO, KATSURA
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DocumentTitleAlternate ABRASIF, BOUE ABRASIVE, ET PROCEDE DE FABRICATION D'UN ABRASIF
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Snippet An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc,...
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SourceType Open Access Repository
SubjectTerms ADHESIVES
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GLASS
GRINDING
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
JOINING GLASS TO GLASS OR OTHER MATERIALS
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MINERAL OR SLAG WOOL
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
PHYSICS
POLISHES
POLISHING
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
TRANSPORTING
Title ABRASIVE, ABRASIVE SLURRY, AND METHOD FOR MANUFACTURING ABRASIVE
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