ABRASIVE, ABRASIVE SLURRY, AND METHOD FOR MANUFACTURING ABRASIVE
An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc, magnetic disc, plasma display, liquid crystal, or LSI photomask. The abrasive is composed of abrasive particles such that the ratio D95/D50 of...
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Main Authors | , , , |
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Format | Patent |
Language | English French Japanese |
Published |
20.06.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc, magnetic disc, plasma display, liquid crystal, or LSI photomask. The abrasive is composed of abrasive particles such that the ratio D95/D50 of the 95% cumulative average diameter (D95) in terms of volume to the 50% cumulative average diameter (D50) in terms of volume lies in the range from 1.2 to 3.0. Therefore high speed of high precision surface grinding is achieved.
L'invention porte sur un abrasif servant au ponçage de précision de substrats utilisés dans les industries optiques et électroniques tels que des substrats de verre pour lentilles, des disques optiques, des disques magnétiques, des écrans à plasma, des cristaux liquides ou des photomasques en LSI. Ledit abrasif comprend des particules abrasives telles que le rapport D95/D50 du diamètre cumulatif volumique moyen de 95 % (D95) par rapport au diamètre cumulatif volumique moyen de 50 % (D50) se situe entre 1,2 et 3,0, ce qui permet d'atteindre des vitesses élevées de ponçage. |
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AbstractList | An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc, magnetic disc, plasma display, liquid crystal, or LSI photomask. The abrasive is composed of abrasive particles such that the ratio D95/D50 of the 95% cumulative average diameter (D95) in terms of volume to the 50% cumulative average diameter (D50) in terms of volume lies in the range from 1.2 to 3.0. Therefore high speed of high precision surface grinding is achieved.
L'invention porte sur un abrasif servant au ponçage de précision de substrats utilisés dans les industries optiques et électroniques tels que des substrats de verre pour lentilles, des disques optiques, des disques magnétiques, des écrans à plasma, des cristaux liquides ou des photomasques en LSI. Ledit abrasif comprend des particules abrasives telles que le rapport D95/D50 du diamètre cumulatif volumique moyen de 95 % (D95) par rapport au diamètre cumulatif volumique moyen de 50 % (D50) se situe entre 1,2 et 3,0, ce qui permet d'atteindre des vitesses élevées de ponçage. |
Author | SAEGUSA, HIROSHI IMAI, FUMIO MASUDA, TOMOYUKI ITO, KATSURA |
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DocumentTitleAlternate | ABRASIF, BOUE ABRASIVE, ET PROCEDE DE FABRICATION D'UN ABRASIF |
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Snippet | An abrasive used for precisely grinding a substrate used in the optics and electronics industries such as a glass substrate of an optical lens, optical disc,... |
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SubjectTerms | ADHESIVES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GLASS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER JOINING GLASS TO GLASS OR OTHER MATERIALS MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MINERAL OR SLAG WOOL MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING |
Title | ABRASIVE, ABRASIVE SLURRY, AND METHOD FOR MANUFACTURING ABRASIVE |
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