LAYERED NANOFABRICATION

A method for fabricating or prototyping a nanoscale object is disclosed. The method includes defining a sequence of nanolayers that represent the nanoscale object, constructing a current nanolayer (104) on a first surface (108), and depositing a sacrificial layer (112) to cover the first surface but...

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Bibliographic Details
Main Authors RESCH, ROLAND, REQUICHA, ARISTIDES, LEWIS, DIANA, KOEL, BRUCE, E
Format Patent
LanguageEnglish
French
Published 16.08.2001
Edition7
Subjects
AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]
MANUFACTURE OR TREATMENT THEREOF
MEASURING
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
PERFORMING OPERATIONS
PHYSICS
SCANNING-PROBE TECHNIQUES OR APPARATUS
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
TESTING
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Summary:A method for fabricating or prototyping a nanoscale object is disclosed. The method includes defining a sequence of nanolayers that represent the nanoscale object, constructing a current nanolayer (104) on a first surface (108), and depositing a sacrificial layer (112) to cover the first surface but not the nanolayer. The nanolayer represents a slice of the nanoscale object. The nanolayer and the sacrificial layer provide a second surface on which a next nanolayer is constructed. The above construction and deposition steps are repeated if the next nanolayer is not the last nanolayer. The method also includes removing the sacrificial layers to produce the nanoscale object. L'invention porte sur un procédé de fabrication ou d'élaboration de prototypes d'objets à l'échelle nano consistant à définir une succession de nanocouches qui constitueront l'objet, puis à former une première nanocouche (104) sur une première surface (108) puis à déposer une couche sacrificielle (112) recouvrant la première surface, mais pas la nanocouche. Ladite nanocouche représente l'une des tranches constitutives de l'objet, et constitue avec la couche sacrificielle une deuxième surface sur laquelle on peut former la nanocouche suivante. Les opérations d'élaboration et de dépôt se répètent si la nanocouche suivante n'est pas la dernière. Le procédé porte également sur l'élimination des couches sacrificielles pour arriver à l'objet final.
Bibliography:Application Number: WO2001US04326