Lithographic method and apparatus
A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first por...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
01.05.2018
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Subjects | |
Online Access | Get full text |
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