Semiconductor device with vertically integrated pHEMTs

The present disclosure relates to a semiconductor device with vertically integrated pseudomorphic high electron mobility transistors (pHEMTs). The disclosed semiconductor device includes a substrate, a lower pHEMT structure with a lower pHEMT, an isolation layer, and an upper pHEMT structure with an...

Full description

Saved in:
Bibliographic Details
Main Authors Schwartz Dana A, Hurtt Sheila K, Nevers Corey A
Format Patent
LanguageEnglish
Published 20.03.2018
Subjects
Online AccessGet full text

Cover

Loading…