Etchant and method of manufacturing display device by using the same
An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3...
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
22.08.2017
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Subjects | |
Online Access | Get full text |
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Abstract | An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same. |
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AbstractList | An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same. |
Author | Nam Gi-Yong Park Young-Chul Choung Jong-Hyun Kuk In-Seol Lee Suck-Jun Kim Seon-Il Kim In-Bae Park Hong-Sick Yu In-Ho Yoon Young-Jin |
Author_xml | – fullname: Yoon Young-Jin – fullname: Yu In-Ho – fullname: Kim In-Bae – fullname: Park Young-Chul – fullname: Kim Seon-Il – fullname: Lee Suck-Jun – fullname: Choung Jong-Hyun – fullname: Kuk In-Seol – fullname: Nam Gi-Yong – fullname: Park Hong-Sick |
BookMark | eNqNyk0KwjAQQOEsdFF_7jAXcGEVWrfWint1XcZkYgLNJJiJ0NuL4AFcPfh4CzXjyFSpUy_aIQsgGwgkLhqIFgJysailvDw_wficRpzA0NtrgscEJX9dHEHGQCs1tzhmWv-6VHDub91lQykOlBNqYpLhfj00-21bN8d698fyAU5cNBk |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | US9741827B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US9741827B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:16:26 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US9741827B23 |
Notes | Application Number: US201414508858 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170822&DB=EPODOC&CC=US&NR=9741827B2 |
ParticipantIDs | epo_espacenet_US9741827B2 |
PublicationCentury | 2000 |
PublicationDate | 20170822 |
PublicationDateYYYYMMDD | 2017-08-22 |
PublicationDate_xml | – month: 08 year: 2017 text: 20170822 day: 22 |
PublicationDecade | 2010 |
PublicationYear | 2017 |
RelatedCompanies | Samsung Display Co., Ltd DONGWOO FINE-CHEM Co., Ltd |
RelatedCompanies_xml | – name: Samsung Display Co., Ltd – name: DONGWOO FINE-CHEM Co., Ltd |
Score | 3.1100974 |
Snippet | An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES |
Title | Etchant and method of manufacturing display device by using the same |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170822&DB=EPODOC&locale=&CC=US&NR=9741827B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_GFPVNp-L8Ig_St6K20e6lCP1iCPvArbK3kaSJFLa22A7Zf--l66Yv-hYSCJfA73J3ud8dwJ1KLMEoTRBpCTWpEog5KaSpKO_pfzln0xtwMHzux_R19jRrQbrlwtR1Qr_q4oiIKIF4r2p9XfwEsYI6t7K85ylO5S_R1A2Mxjt-dHQBcyPw3HA8Cka-4ftuPDGGb-gsUbSkHQ-19Z62onWZ_fDd06SU4veLEh3D_hg3y6oTaMmsA4f-tvFaBw4GzX83DhvolacQhJUm6VYEXX-y6ftMckWWLFtpckLNNiRJWhYLtiaJ1AqA8DXRee0fBK08UrKlPAMShVO_b6I4893R5_FkJ7h9Du0sz-QFENtmgnGpHhTrUWo5nFvouXElha3TtJIudP_c5vKftSs40neoQ6aWdQ3t6nMlb_DNrfhtfVvfAiKHuQ |
link.rule.ids | 230,309,786,891,25594,76904 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3PS8MwFH6MKc6bTsX5MwfprahttLsMob-ounXDtbLbSNpkDFw3bIfsv_el66YXvYUEHknge8mXvO89gBuZGgmjNEWkpVSnMkHMiUTokvK2-pez1rUBe-FjENOX0cOoBtONFqbME_pVJkdERCWI96L014ufRyy3jK3Mb_kUu-ZPftRxtYod31sqgbnm2h1v0Hf7juY4nXiohW9IlijepC0bvfWOhYxQpdn33m0lSln8PlH8A9gdoLGsOISayJrQcDaF15qw16v-u7FZQS8_AtcrlEi3IEj9ybruM5lLMmPZUokTSrUhSaf54oOtSCqUAyB8RVRc-4TgLY_kbCaOgfhe5AQ6Tme8Xfo4Hm4nbp5APZtn4hSIabKEcSHvJGtTalicG8jcuBSJqcK00ha0_jRz9s_YNTSCqNcdd5_D13PYV_upnk8N4wLqxedSXOL5W_Crcue-AYD9iqQ |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Etchant+and+method+of+manufacturing+display+device+by+using+the+same&rft.inventor=Yoon+Young-Jin&rft.inventor=Yu+In-Ho&rft.inventor=Kim+In-Bae&rft.inventor=Park+Young-Chul&rft.inventor=Kim+Seon-Il&rft.inventor=Lee+Suck-Jun&rft.inventor=Choung+Jong-Hyun&rft.inventor=Kuk+In-Seol&rft.inventor=Nam+Gi-Yong&rft.inventor=Park+Hong-Sick&rft.date=2017-08-22&rft.externalDBID=B2&rft.externalDocID=US9741827B2 |