Patterning device support and lithographic apparatus
A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibra...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
22.08.2017
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Subjects | |
Online Access | Get full text |
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