Substrate support structure, vacuum drying apparatus and method for vacuum drying a substrate

Disclosed is a substrate support structure, a vacuum drying apparatus and a method for vacuum drying a substrate. The substrate support structure comprises: a support pin having a top end for supporting a substrate; and an auxiliary support assembly including: a drive device; a support rod driven by...

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Bibliographic Details
Main Authors Yuan Min, Zhang Hequn, Yang Longgen, Xing Hongwei, Mu Huihui
Format Patent
LanguageEnglish
Published 01.08.2017
Subjects
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