Method of manufacturing semiconductor device
Provided is a semiconductor device with improved reliability that achieves the reduction in size. A semiconductor wafer is provided that has a first insulating member with an opening that exposes from which an upper surface of an electrode pad. Subsequently, after forming a second insulating member...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
18.07.2017
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Subjects | |
Online Access | Get full text |
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