Arrangement and lithography apparatus with arrangement

• Main Authors: Prochnau Jens, Nefzi Marwene
• Format: Patent
• Language: English
• Published: 25.04.2017
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BEARINGS; BLASTING; CINEMATOGRAPHY; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; ELEMENTS OR CRANKSHAFT MECHANISMS; ENGINEERING ELEMENTS AND UNITS; FLEXIBLE SHAFTS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; GENERATION; HEATING; HOLOGRAPHY; LIGHTING; MATERIALS THEREFOR; MECHANICAL ENGINEERING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; SHAFTS; THERMAL INSULATION IN GENERAL; WEAPONS

An arrangement for a lithography apparatus has a component and a weight compensating device to compensate for a weight of the component. The weight compensating device includes a first magnetic device and a second magnetic device. The first magnetic device is designed to exert a first magnetic force on the component. The first magnetic force exceeds the weight of the component. The first magnetic force acts counter to the weight of the component. The second magnetic device is designed to exert a second magnetic force on the component. The second magnetic force acts in the direction of the weight of the component. The first magnetic force corresponds to the sum of the second magnetic force and the weight. The second magnetic device is designed to reduce the second magnetic force at the same time and by the same absolute value as the first magnetic force.