Apparatus and operation method thereof

An apparatus includes a body and a surface for receiving a semiconductor wafer carrier is provided. A nozzle and a venting hole are provided on the surface. The semiconductor wafer carrier has at least one selectively closable capped opening at a bottom, top and/or side surface thereof. The capped o...

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Bibliographic Details
Main Authors Liao Si-Wen, Xu Jia-Wei, Lo Fu-Shun, Wu Chien-Cheng, Lin Mao-Cheng, Liu Ding-I, Wang Lan-Hai
Format Patent
LanguageEnglish
Published 28.03.2017
Subjects
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