Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation...

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Bibliographic Details
Main Authors Kunnen Johan Gertrudis Cornelis, Derks Sander Catharina Reinier, Van Abeelen Hendrikus Johannes Marinus, Dassen Armand Rosa Jozef, Houben Martijn, Laurent Thibault Simon Mathieu
Format Patent
LanguageEnglish
Published 21.02.2017
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