Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include fir...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
20.09.2016
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Subjects | |
Online Access | Get full text |
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