Apparatus and method for cleaning photomask
This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate fo...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
26.07.2016
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Subjects | |
Online Access | Get full text |
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Summary: | This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate. |
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Bibliography: | Application Number: US201414255557 |