Arrangement for plasma processing system control based on RF voltage
An arrangement for controlling a plasma processing system is provided. The arrangement includes an RF sensing mechanism for obtaining an RF voltage signal. The arrangement also includes a high impedance arrangement coupled to the RF sensing mechanism to facilitate acquisition of the signal while red...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
08.09.2015
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Subjects | |
Online Access | Get full text |
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