Semiconductor devices having a recessed electrode structure

An electrode structure is described in which conductive regions are recessed into a semiconductor region. Trenches may be formed in a semiconductor region, such that conductive regions can be formed in the trenches. The electrode structure may be used in semiconductor devices such as field effect tr...

Full description

Saved in:
Bibliographic Details
Main Authors PALACIOS TOMAS APOSTOL, LU BIN, MATIOLI ELISON DE NAZARETH
Format Patent
LanguageEnglish
Published 26.05.2015
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:An electrode structure is described in which conductive regions are recessed into a semiconductor region. Trenches may be formed in a semiconductor region, such that conductive regions can be formed in the trenches. The electrode structure may be used in semiconductor devices such as field effect transistors or diodes. Nitride-based power semiconductor devices are described including such an electrode structure, which can reduce leakage current and otherwise improve performance.
Bibliography:Application Number: US201213649658