Semiconductor device comprising a capacitor formed in the metallization system based on dummy metal features

When forming capacitive structures in a metallization system, such as in a dynamic RAM area, placeholder metal regions may be formed together with "regular" metal features, thereby achieving a very efficient overall process flow. At a certain manufacturing stage, the metal of the placehold...

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Bibliographic Details
Main Authors BAARS PETER, SCHROEDER VIVIEN, SCHLOESSER TILL
Format Patent
LanguageEnglish
Published 29.07.2014
Subjects
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