Lithographic apparatus and method

A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section...

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Bibliographic Details
Main Authors JANSSEN FRANCISCUS JOHANNES JOSEPH, HOOGENDAM CHRISTIAAN ALEXANDER
Format Patent
LanguageEnglish
Published 24.06.2014
Subjects
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