Lithographic apparatus and method
A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
24.06.2014
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!