Method of manufacturing semiconductor device having surface protective films on bond pad
To provide: a technique capable of suppressing a titanium nitride film that is exposed at the side surface of an opening from turning into a titanium oxide film even when water permeates the opening over a pad from outside a semiconductor device and thus improving the reliability of the semiconducto...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
06.05.2014
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Subjects | |
Online Access | Get full text |
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