Method of manufacturing semiconductor device having surface protective films on bond pad

To provide: a technique capable of suppressing a titanium nitride film that is exposed at the side surface of an opening from turning into a titanium oxide film even when water permeates the opening over a pad from outside a semiconductor device and thus improving the reliability of the semiconducto...

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Bibliographic Details
Main Authors TAKATA YOSHIFUMI, HONMA TAKURO
Format Patent
LanguageEnglish
Published 06.05.2014
Subjects
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