Process device with sampling skew

• Main Author: SCHULTE JOHN P
• Format: Patent
• Language: English
• Published: 25.12.2012
• Subjects: AMPLIFIERS; BASIC ELECTRONIC CIRCUITRY; CALCULATING; COMPUTING; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTRICITY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL; METERING BY VOLUME; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; TESTING

An industrial process device for monitoring or controlling an industrial process includes a first input configured to receive a first plurality of samples related to a first process variable and a second input configured to receive a second plurality of samples related to a second process variable. Compensation circuitry is configured to compensate for a time difference between the first plurality of samples and the second plurality of samples and provide a compensated output related to at least one of the first and second process variables. The compensated output can comprise, or can be used to calculate a third process variable. The third process variable can be used to monitor or control the industrial process.