Fast method to model photoresist images using focus blur and resist blur

• Main Authors: LAI KAFAI, GORDON RONALD L, BRUNNER TIMOTHY A, SEONG NAKGEUON, ROSENBLUTH ALAN E, GALLATIN GREGG M
• Format: Patent
• Language: English
• Published: 07.08.2012
• Subjects: CALCULATING; COMPUTING; COUNTING; HANDLING RECORD CARRIERS; PHYSICS; PRESENTATION OF DATA; RECOGNITION OF DATA; RECORD CARRIERS

A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns...