Etching of nano-imprint templates using an etch reactor

• Main Authors: KUMAR AJAY, CHANDRACHOOD MADHAVI R
• Format: Patent
• Language: English
• Published: 07.06.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; DECORATIVE ARTS; ELECTROGRAPHY; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; MOSAICS; ORIGINALS THEREFOR; PAPERHANGING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRODUCING DECORATIVE EFFECTS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TARSIA WORK; TRANSPORTING

Methods for etching a metal layer using an imprinted resist material are provided. In one embodiment, a method for processing a photolithographic reticle includes providing a reticle having a metal photomask layer formed on an optically transparent substrate and an imprinted resist material deposite...