Methods and systems for identifying defect types on a wafer
Various methods and systems for identifying defect types on a wafer are provided. One computer-implemented method for identifying defect types on a wafer includes acquiring output of an inspection system for defects detected on a wafer. The output is acquired by different combinations of illuminatio...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
01.06.2010
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | Various methods and systems for identifying defect types on a wafer are provided. One computer-implemented method for identifying defect types on a wafer includes acquiring output of an inspection system for defects detected on a wafer. The output is acquired by different combinations of illumination and collection channels of the inspection system. The method also includes identifying defect types of the defects based on the output acquired by a set of the different combinations. The set of the different combinations is selected based on the defect types to be identified on the wafer and a wafer type of the wafer such that a different set of the different combinations of the illumination and collection channels is used for identifying different defect types on different wafer types. |
---|---|
AbstractList | Various methods and systems for identifying defect types on a wafer are provided. One computer-implemented method for identifying defect types on a wafer includes acquiring output of an inspection system for defects detected on a wafer. The output is acquired by different combinations of illumination and collection channels of the inspection system. The method also includes identifying defect types of the defects based on the output acquired by a set of the different combinations. The set of the different combinations is selected based on the defect types to be identified on the wafer and a wafer type of the wafer such that a different set of the different combinations of the illumination and collection channels is used for identifying different defect types on different wafer types. |
Author | SHEN WEI-NING SAITO JASON |
Author_xml | – fullname: SHEN WEI-NING – fullname: SAITO JASON |
BookMark | eNqNyj0KwkAQBtAttPAnd5gL2EQwBjtFsbFS67Bkv4kLcXbJDMje3sYDWL3mLd1MkmDhDjfYKwUlL4G0qOGtxGmiGCAWuUQZKIDRG1nJUEpCnj6eMa3dnP2oqH6uHF3Oj9N1g5w6aPY9BNY9701T79tde6y3f5QvU1Yw5Q |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US7728969B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US7728969B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:24:19 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US7728969B23 |
Notes | Application Number: US20070949473 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100601&DB=EPODOC&CC=US&NR=7728969B2 |
ParticipantIDs | epo_espacenet_US7728969B2 |
PublicationCentury | 2000 |
PublicationDate | 20100601 |
PublicationDateYYYYMMDD | 2010-06-01 |
PublicationDate_xml | – month: 06 year: 2010 text: 20100601 day: 01 |
PublicationDecade | 2010 |
PublicationYear | 2010 |
RelatedCompanies | KLA-TENCOR TECHNOLOGIES CORP |
RelatedCompanies_xml | – name: KLA-TENCOR TECHNOLOGIES CORP |
Score | 2.7693083 |
Snippet | Various methods and systems for identifying defect types on a wafer are provided. One computer-implemented method for identifying defect types on a wafer... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
Title | Methods and systems for identifying defect types on a wafer |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100601&DB=EPODOC&locale=&CC=US&NR=7728969B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5Kfd40KtYXe5DcgmnzaIIEIUlDEdIW20hvZTe7gVzS0o307zvZPvSi11kYZhfmsfP4BuDZpH7es6hj9DgvDJt2C8N3qWlwk1oc3RllatlEOnKHmf0-d-YtKPezMAondKPAEVGjctT3Wtnr1U8SK1a9lfKFlUhaviWzINZ3v-OughfR4zAYTMbxONKjKMim-ugjwCDS810_RGt9hFF0v-n-GnyGzVDK6rdHSS7geILMqvoSWqLS4CzaL17T4DTd1bs1OFENmrlE4k4J5RW8pmrrsyS04mSLxCwJxp6kVEO3anCJcNH0aZAmwyrJsiKUbGgh1tdAksEsGhooz-Jw90U2PUhu3UC7WlbiFggTReH4nPc9gfGDyVizQppTq287LLccrwOdP9nc_XN2D-fb6niTZXiAdr3-Eo_odGv2pJ7rG_Erh0Q |
link.rule.ids | 230,309,783,888,25578,76884 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1ZT8JAEJ4QPPBNUSOe-2D61ljoQRvTmNAjqBSIgOGN7Ha3SV9aQmv4-06XQ1_0dTaZzG4yx87xDcCjRp24o1NT7XCeqAZtJ6pjUU3lGtU5ujPK5LKJaGj1Z8bb3JzXIN3Nwkic0LUER0SNilHfS2mvlz9JLF_2VhZPLEVS_hJOXV_Z_o7bEl5E8XtuMB75I0_xPHc2UYYfLgaRtmM5PbTWBxhh2xXMfvDZq4ZSlr89SngKh2NklpVnUBNZExrebvFaE46jbb27CUeyQTMukLhVwuIcniO59bkgNONkg8RcEIw9SSqHbuXgEuGi6tMgVYa1IHlGKFnTRKwugITB1OurKM9if_fFbLKXXL-EepZn4goIE0liOpx3bYHxg8ZYtUKaU71rmCzWTbsFrT_ZXP9z9gCN_jQaLAavw_cbONlUyquMwy3Uy9WXuEMHXLJ7-XTfcXyKNA |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Methods+and+systems+for+identifying+defect+types+on+a+wafer&rft.inventor=SHEN+WEI-NING&rft.inventor=SAITO+JASON&rft.date=2010-06-01&rft.externalDBID=B2&rft.externalDocID=US7728969B2 |