Trench field effect transistor and method of making it
A method of manufacturing an insulated gate field effect transistor includes providing a substrate (2) having a low-doped region (4), forming insulated gate trenches (8) and implanting dopants of a first conductivity type at the base of the trenches (8). A body implant is implanted in the low-doped...
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Main Author | |
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Format | Patent |
Language | English |
Published |
23.03.2010
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Subjects | |
Online Access | Get full text |
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