Circuitry and methodology to establish correlation between gate dielectric test site reliability and product gate reliability

A method and system for predicting gate reliability. The method comprises the steps of stressing a gate dielectric test site to obtain gate dielectric test site data and using the test site data to predict gate reliability. Preferably, the test structure and the product structure are integrated in s...

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Main Authors VAN HORN JODY J, NOWAK EDWARD J, BERNSTEIN KERRY, STRONG ALVIN W, WU ERNEST Y, BOLAM RONALD J
Format Patent
LanguageEnglish
Published 20.11.2007
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Abstract A method and system for predicting gate reliability. The method comprises the steps of stressing a gate dielectric test site to obtain gate dielectric test site data and using the test site data to predict gate reliability. Preferably, the test structure and the product structure are integrated in such a manner that a test site occupies some of the product area and the product itself occupies the remainder of the product area. A preferred methodology, more specifically, is as follows: (1) Test structures at start both in parallel stress mode and in ring oscillator or "product" mode; (2) Analyze the breakdown data as per the present state of the art for each of the areas based on the parallel stress mode; (3) Combine the above breakdown distributions using the area scaling to improve the confidence bounds of the Weibull slope of the cumulative distribution function; (4) Test the ring oscillators in the product mode to determine how many of the stress fails are also product fails as defined by an operational degradation; (5) Subdivide the failures to determine the relationship between the first fail, and the second fail, and the nth fail; (6) Investigate which stress fail, if not the first stress fail, is more likely to cause a product fail as defined by operational degradation; and (7) Based on the subdivision in step 5 and the results in step 6, make projection based on that fail which is most likely to cause fail. The methodology as outlined above bridges between dielectric stress fails and product degradation both in the case of each stress fail causing a product degradation, as well as in the case where more than one stress fail occurs before any product degradation occurs. And this relationship can be quantified.
AbstractList A method and system for predicting gate reliability. The method comprises the steps of stressing a gate dielectric test site to obtain gate dielectric test site data and using the test site data to predict gate reliability. Preferably, the test structure and the product structure are integrated in such a manner that a test site occupies some of the product area and the product itself occupies the remainder of the product area. A preferred methodology, more specifically, is as follows: (1) Test structures at start both in parallel stress mode and in ring oscillator or "product" mode; (2) Analyze the breakdown data as per the present state of the art for each of the areas based on the parallel stress mode; (3) Combine the above breakdown distributions using the area scaling to improve the confidence bounds of the Weibull slope of the cumulative distribution function; (4) Test the ring oscillators in the product mode to determine how many of the stress fails are also product fails as defined by an operational degradation; (5) Subdivide the failures to determine the relationship between the first fail, and the second fail, and the nth fail; (6) Investigate which stress fail, if not the first stress fail, is more likely to cause a product fail as defined by operational degradation; and (7) Based on the subdivision in step 5 and the results in step 6, make projection based on that fail which is most likely to cause fail. The methodology as outlined above bridges between dielectric stress fails and product degradation both in the case of each stress fail causing a product degradation, as well as in the case where more than one stress fail occurs before any product degradation occurs. And this relationship can be quantified.
Author BERNSTEIN KERRY
VAN HORN JODY J
WU ERNEST Y
NOWAK EDWARD J
BOLAM RONALD J
STRONG ALVIN W
Author_xml – fullname: VAN HORN JODY J
– fullname: NOWAK EDWARD J
– fullname: BERNSTEIN KERRY
– fullname: STRONG ALVIN W
– fullname: WU ERNEST Y
– fullname: BOLAM RONALD J
BookMark eNqNjDsOwjAQRF1Awe8OewGKBIlPSwSiB-poYy_JSsYb2RuhFNydSKGgpBrpzZuZm0mQQDPzLjjajjX2gMHBk7QRJ17qHlSAkmLlOTVgJUbyqCwBKtIXUYAalcAxebIa2YIOOiQe4KAyVuxZx9s2iuusjoufcmmmD_SJVt9cGDifbsVlTa2UlFq0FEjL-3WXH_bZNjvmmz-UD-S-Stk
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US7298161B2
GroupedDBID EVB
ID FETCH-epo_espacenet_US7298161B23
IEDL.DBID EVB
IngestDate Fri Jul 19 12:02:39 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US7298161B23
Notes Application Number: US20050088953
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071120&DB=EPODOC&CC=US&NR=7298161B2
ParticipantIDs epo_espacenet_US7298161B2
PublicationCentury 2000
PublicationDate 20071120
PublicationDateYYYYMMDD 2007-11-20
PublicationDate_xml – month: 11
  year: 2007
  text: 20071120
  day: 20
PublicationDecade 2000
PublicationYear 2007
RelatedCompanies INTERNATIONAL BUSINESS MACHINES CORPORATION
RelatedCompanies_xml – name: INTERNATIONAL BUSINESS MACHINES CORPORATION
Score 2.6935387
Snippet A method and system for predicting gate reliability. The method comprises the steps of stressing a gate dielectric test site to obtain gate dielectric test...
SourceID epo
SourceType Open Access Repository
SubjectTerms INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
TESTING
Title Circuitry and methodology to establish correlation between gate dielectric test site reliability and product gate reliability
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071120&DB=EPODOC&locale=&CC=US&NR=7298161B2
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1La8JAEB7EPm-tbdG-2EPJLdQQjckhFEwMUvBB1eJN9iXsJYpGeup_7-yusV7a6-5mYJf9ZiffvABemswT1OPcFXhd3FbkIaSYCN229IPQF5GMAp3gPBgG_Vnrfd6eV0CVuTCmTuiXKY6IiOKI98Lo6_UviZWa2MrtK1M4tHrLpnHqlH_HHTQfmk7ajXvjUTpKnCSJZxNn-BGjDRmicdNFbX2irWhdZr_32dVJKevjFyW7gtMxCsuLa6jIvAYXSdl4rQbng72_uwZnJkCTb3FwD8LtDXwnasN3CtcSmgtie0AbdpwUK4JanhpmiXDdeMOGupF9OBbRpBkRyja_UZygoVkQ7UAmuFTZmt1W7NqWgrVfHE3eAsl606Tv4o4Wh9NbzCaHvft3UM1XuawDoZ2QRkEol9qvSDmjob_0mO45tmSMS9GAxp9i7v-Ze4BLw356HuLvEarFZief8Nku2LM58B9Q5aFi
link.rule.ids 230,309,786,891,25594,76904
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8JAEJ4QfOBNUSM-92B6a6QplPbQmNBCUHlFwHAj-yLZSyFQ4sn_7uwuKBe97m4n2U2_2dl5fAPwWGWeoB7nrsDfxa1FHkKKidCtSz8IfRHJKNAFzr1-0JnUXqf1aQHUrhbG8IR-GnJERBRHvOdGXy9_nVipya1cPzGFQ4vn9jhOnd3ruIHmQ9VJm3FrOEgHiZMk8WTk9N9jtCFDNG6aqK0PGvgi1DT7rY-mLkpZ7t8o7VM4HKKwLD-DgszKUEp2jdfKcNzbxrvLcGQSNPkaB7cgXJ_DV6JWfKNwLaGZILYHtPGOk3xBUMtT41kiXDfesKluZJuORbTTjAhlm98oTtDQzIkOIBNcqixntxW7tFSw9ou9yQsg7dY46bi4o9nP6c0mo5-9-5dQzBaZvAJCGyGNglDOdVyRckZDf-4x3XNszhiXogKVP8Vc_zP3AKXOuNeddV_6bzdwYjyhnodYvIVivtrIO7zCc3ZvDv8bBHmkTQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Circuitry+and+methodology+to+establish+correlation+between+gate+dielectric+test+site+reliability+and+product+gate+reliability&rft.inventor=VAN+HORN+JODY+J&rft.inventor=NOWAK+EDWARD+J&rft.inventor=BERNSTEIN+KERRY&rft.inventor=STRONG+ALVIN+W&rft.inventor=WU+ERNEST+Y&rft.inventor=BOLAM+RONALD+J&rft.date=2007-11-20&rft.externalDBID=B2&rft.externalDocID=US7298161B2