Substrate processing apparatus for processing substrates using dense phase gas and sonic waves

Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the...

Full description

Saved in:
Bibliographic Details
Main Authors CHING GIL, FRESQUET GILLES, RUCH VINCENT, PERRUT VINCENT
Format Patent
LanguageEnglish
Published 25.04.2006
Subjects
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PREVENTION OF FOULING IN GENERAL
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.
Bibliography:Application Number: US20050073060