Apparatus and method for plasma assisted deposition
Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus comprises a substrate processing chamber including a top shower plate, a power source coupled to the top shower...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
14.02.2006
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!