Method of conforming an adherent film to a substrate by application of vacuum
Films are closely conformed to substrates by reducing the air pressure to a subatmospheric level in at least one airflow pathway that is present in the film or the substrate. The reduced air pressure enables the film to tightly contact the substrate in locations where protrusions or depressions on t...
Saved in:
Main Authors | , , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
29.03.2005
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!