Wafer defect inspection machine having a dual illumination system

A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical sy...

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Bibliographic Details
Main Authors KUROSAWA TOSHIROU, KATSUKI YUZO, TAKEBAYASHI JUN
Format Patent
LanguageEnglish
Published 15.03.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.
Bibliography:Application Number: US20020295621