Linewidth measurement structure with embedded scatterometry structure

• Main Authors: NARIMAN HORMUZDIAR E, WRISTERS DERICK J
• Format: Patent
• Language: English
• Published: 23.11.2004
• Edition: 7
• Subjects: APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MEASURING; PHYSICS; SCANNING-PROBE TECHNIQUES OR APPARATUS; SEMICONDUCTOR DEVICES; TESTING

A method of manufacturing a semiconductor device includes depositing a layer over a substrate and etching the layer to form a grating structure, a cross bridge test structure and a line width measurement structure. The grating structure includes a plurality of parallel lines and one of the multiple...