Method for automated determination of reticle tilt in a lithographic system

• Main Author: EHRICHS EDWARD E
• Format: Patent
• Language: English
• Published: 18.02.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTROGRAPHY; HOLOGRAPHY; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SCANNING-PROBE TECHNIQUES OR APPARATUS; TESTING

A method, system, and storage medium for determining retide tilt in a lithographic system is provided. Test patterns contained on a reticle are printed in a photoresist located on an upper surface of a semiconductor substrate by a lithographic system. The test patterns may include three posts of dif...