Charged particle beam exposure apparatus

• Main Author: SETO ISAMU
• Format: Patent
• Language: English
• Published: 18.06.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

Pattern data correction controllers 64i are provided one for each column, correction operation processing is performed on exposure data according to the characteristics of each corresponding column, the operation processing time corresponding to the exposure processing cycle required in the corresponding column is computed from data SD1, SCD1, WDM1, WDS1 indicating a per-shot exposure time, exposure time correction value, and settling waiting time generated based on the correction operation processing, a maximum value is detected from among the operation processing times computed by the respective pattern data correction controllers and, based on data PCD representing the operation processing time of the maximum value thus detected, an operation processing clock CK is generated and supplied to correction operation processing blocks 72 to 74 in the respective pattern data correction controllers.