Method of forming photomask and pattern and method of forming a semiconductor device
A photomask where interconnection patterns and a contact hole pattern are drawn is used. According to the method, an overlay error due to a manufacturing error among reticles can be restricted.
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Main Author | |
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Format | Patent |
Language | English |
Published |
24.10.2000
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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