Process for antistatic treatment of resin and antistatic resin composition
The present invention provides a process for the antistatic treatment of a resin which comprises dispersing the following organically-modified layer silicate in a synthetic resin in the state that the following specific state is attained. A novel resin composition is provided, comprising an organica...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
09.03.1999
|
Edition | 6 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The present invention provides a process for the antistatic treatment of a resin which comprises dispersing the following organically-modified layer silicate in a synthetic resin in the state that the following specific state is attained. A novel resin composition is provided, comprising an organically-modified layer silicate compound having a specific volume resistivity of not more than 1x1013 OMEGA xcm dispersed in a synthetic resin in a proportion of from 2 to 30 parts by weight based on 100 parts by weight of said synthetic resin in the state that (1) a primary aggregate and/or a secondary aggregate having a short axis length of not more than 500 nm is formed and (2) the average minimum interparticle distance is not more than 500 nm. |
---|---|
Bibliography: | Application Number: US19970792131 |